By Kash L. Mittal
This booklet chronicles the complaints of the 1st foreign Symposium on Adhesion facets of skinny movies held below the auspices of MST meetings in Newark, New Jersey, October 28-29, 1999.
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Additional info for Adhesion Aspects of Thin Films
R. C. Cammarata, Prog. Surf: Sci. 46, 1 (1994). 17. R. C. Cammarata, T. M. Trimble and D. J. Srolovitz, J. Matel: Res. (in press). Adhesion Aspects of Thin Films, Vol. 1, pp, 35-50 Ed. K. L. 7 Appia km. 712, 72100 Brindisi, Italy Abstract-In general, optical thin films, produced by physical vapor deposition methods involving ions (ion beam sputtering, RF sputtering) are denser than films grown by the conventional thermal evaporation methods. Nevertheless, the high level of the film stress and its effect on film-substrate adhesion is the main disadvantage that limits the use of the ion techniques to deposit optical coatings.
Ala0 relation (Fig. 6a) may be used to obtain the dependence of interatomic mean stress on a/ao, shown in Fig. 6b. In Fig. 6b, the positive numbers indicate tensile stress and negative numbers indicate Fundamental aspects of residual stress evolution in thin metal films 25 0 -1 5 - -2 h ?! lao -+I Ir- 20 u o w 01 substrate E-20 ;j -40 I -60 " " " " . 5 2 maximum attractive interatomic forces between columns Figure 6. (a) Interatomic potential energy vs. ala0 where a is the interatomic distance and a0 is the equilibrium value of a, and (b) interatomic mean stress vs.
1, pp. 5 1 -65 Ed. K. L. *, STURE HOGMARK' and JENS GUNNARS ' Department of Materials Science, Uppsala Universiy, SE-751 21 Uppsala, Sweden * Det Norske Veritas, PO. Box 49306, SE-100 29 Stockholm, Sweden Abstract-Most of today's thin ceramic coatings generated by PVD or CVD techniques are in a residual stress state. This state has a number of origins and will be of either tensile or compressive nature. On topographic substrates which are not perfectly smooth, flat and infinitely large, tensile stresses are always induced across the coating-substrate interface.
Adhesion Aspects of Thin Films by Kash L. Mittal